Nicolet ECO 2000
FT-IR Metrology Tool
* 1999 Vintage
* With Asyst 2200 SMIF loader, or manual loading of
100 mm to 200 mm
wafers
* The NicoletTM ECOTM 2000 measures dopant concentration
levels in
dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels
in silicon nitride films, epitaxial film thickness,
MEMS device thickness, and substitutional carbon and
interstitial oxygen levels in silicon wafers.
Some of the highlights of the ECO 2000 include:
* Completely automated wafer handling
* Automated wafer centering and alignment using flats
or notches
* High throughput
* Exceptionally stable and reproducible measurement
results
* Wafer contact using Teflon-coated vacuum holds on
the backside only
* Capable of measuring epitaxial film thickness from
300 nm to 7,500 nm
* Powerful FT-IR software toolkit for custom recipe
generation
* SECS/GEM communications software
* Compliant with SEMI S2 and S8 safety and ergonomic
standards
* Flexible measurement options from single point measurements
to complete wafer mapping options
* Transmission and reflectance measurement capability
to accommodate the widest range of materials and films
* Support of both ASTM and JEIDA standards
* Class 2 cleanroom ready
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