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OAI 2000 Exposure tool,
set up for edge-bead
may be configured as either an edge-bead exposure tool
or a flood exposure system;
for more info, please see: http://www.oainet.com/OAI_2000.html
"The OAI 2000SM Edge-bead Exposure System provides
a cost-effective method for edge-bead removal using
standard shadow mask technology.
Mask and substrate changeover can be accomplished quickly
and easily adding to the versatility as well as throughput
of this high volume production tool.
The Model 2000 systems include a UV lightsource, intensity
controlling power supply and robotic substrate handling
subsystem. UV lightsources provide
adjustable intensity beams with divergence half-angles
of <2.0%. Power supplies are available from 200W
to 2,000W. Intensity controller sensors are
linked directly to the lightsource for accurate intensity
monitoring. The OAI robotic substrate handling system
is microprocessor controlled and may be
programmed to accommodate a wide variety of substrate
sizes. The shadow mask capability enables the user to
pattern the top-side of a substrate while
being held in very close proximity to the mask. At a
separation of 25 microns, these systems are capable
of 6 micron resolution.
2000FL Flood Exposure Systems are used to augment and/or
enhance the photolithography processes in both production
and R&D settings. Applications
include photoresist stabilization and modification,
image reversal and PCM processes."
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Plasmatek Labs,
5225 Grumman Dr., Ste.
#164, Carson City, NV
89706 USA
Tel. (800) 770-7520,
(775) 885 2900
Fax. (775) 885 2922
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