Oxford Mod. uP RIE Plasma Etch system
7" dia electrode, Al chamber, ea gas inputs, ENI Mod. ACG-3 RF Generator, solid state, air cooled, 300W @ 13.56MHz, Auto (PLC)/manual logic, Vacuum general Mod. MDV-028 Throttle Valve with Mod. 80-2 Controller, 3ea VG Mass Flow Gas Controllers, with roughing pump |