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Davis and Wilder Mod. 425 Plasma Etch System
* 1ea Stainless Steel Chamber 32"ID x 7.75"H,
with 1ea 28.25" dia table (bottom electrode) water
cooled, 1ea focus ring (top electrode) w/adjustable
feet, 1 set of chamber quartz and gas dispersion tubes,
18” W chamber opening;
* 1ea D&W gas panel, w/3ea mass flow gasses, 3ea
regulator (pressure controlled) gasses;
* 1ea D&W Mod. 4090 control panel, used to monitor:
DC volts, RF Amps, System pressure, time, table rotation,
LN2, venting, Door interlocks, Start, Pressure set point,
and pressure controls. With four position key for system
logic: On, Standby, clean, and off;
* 1ea D&W Mod. 4080 control panel, used to select
number of cycles (four maximum), gasses used (six maximum),
RF power level, and etch time for each cycle;
* 1ea D&W Mod. 5000 Auxiliary Panel, used to monitor:
critical valve status, gas stabilization time delays,
low pressure set points, table water, system interlocks,
aux time delay, LN2 control, and rotation speed control;
* 1ea Vacuum General Mod. 78-2SP Throttle valve controller,
w/four set points;
* 1ea Vacuum General Mod. 77-4BSP Mass Flow Gas Controller,
three channel;
* 1ea D&W Mod. 4095 circuit breaker panel, with
breakers for: Mech Pump, System Power, RF Power Supply,
Blower;
* 1ea Plasma Therm Mod. AMNS-3000 automatch network,
installed w/Phase and Magnitude Detector;
* 1ea Plasma Therm Mod. HFS 2000 RF Power Supply, 2KW
@ 13.56MHz, w/AMN-PS2 automatch power supply, and APCS
control panel (single channel);
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